High-NA EUV

ASML, TSMC, Samsung and Intel announced on September 8th a joint initiative to transition the chip industry to 12-inch photomasks and High-NA EUV lithography, targeting a 12-inch mask pilot line by 20…

Belgian semiconductor research institute imec announced the world's first quantum dot qubit device fabricated using High-NA EUV lithography, a breakthrough that could align quantum computing manufactu…