ASML and TSMC want bigger masks for smaller chips

ASML and TSMC are developing larger photomasks to enable smaller chip features, according to a report from The Register. The companies aim to increase the mask size from the current 6x6 inches to 6x12 inches, which would allow for more efficient patterning of advanced nodes. This move is part of efforts to extend the life of optical lithography before the transition to high-NA EUV tools.

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